About
As semiconductor manufacturing continues to push the limits of miniaturization and process control, advanced lithography and patterning technologies become essential for producing next-generation chips. SPIE Advanced Lithography + Patterning provides a platform to explore solutions for metrology, inspection, and process integration, areas where Demcon high-tech systems applies its expertise in mechatronic design, high-precision positioning, and system integration.
Our focus as SPIE Advanced Lithography + Patterning
Semicon
We design and realize customized modules and machines for semiconductor production equipment. Our expertise includes high-accuracy positioning systems, metrology solutions, and integrated mechatronic designs that meet the demands of sub-nanometer precision.Measurement & Control
We develop solutions for metrology and inspection systems, combining mechanical, thermal, and control engineering to achieve stability and accuracy in advanced semiconductor processes.
Poster presentation by Sven Hol
Sven Hol, senior system engineer at Demcon high-tech systems, will present a poster at the Metrology, Inspection, and Process Control XL conference on his paper “Fast and accurate stages design for sub-nanometer accuracy”. The presentation will address key challenges in designing stages for sub-nanometer accuracy and share practical strategies across mechanical, thermal, control, and actuator engineering, as well as metrology and vibration isolation.
Join the poster session on 25 February 2026, at 5:30PM at the Metrology, Inspection, and Process Control XL conference.
Connect with us at SPIE Lithography + Patterning
Meet us at booth #410 at the SPIE Advanced Lithography + Patterning exhibition to learn more about our work in semiconductor equipment development and metrology solutions.
Find the full event details here.