Electromagnetic actuators are an important actuation tool to achieve positioning precision on the nanometer scale. In this realm Lorentz actuators are the mostly used, due to their linear dependence between actuation force and applied current. The ever growing demand to increase the force efficiency of the actuator leads towards more detailed investigations of reluctance actuation. Overall, we find that a Lorentz actuator is limited by dissipation, while a reluctance actuator is limited by magnetic saturation.
From September 8 to 11, 2026, the photomask and EUV lithography community gathers in Monterey, California, for SPIE Photomask Technology + EUV Lithography. Demcon high-tech systems will be present at the exhibition on September 9 and 10.
About
EUV lithography keeps pushing toward smaller feature sizes and higher NA systems. This raises the bar for every component inside the machine, from actuators to positioning stages. SPIE Photomask Technology + EUV Lithography brings together the engineers and scientists solving these challenges, across photomasks, patterning, metrology, and emerging lithography technologies.
Demcon high-tech systems develops modules and systems for the semiconductor equipment manufacturers behind these lithography advancements. Our multidisciplinary teams combine mechatronics, control, thermal, and software expertise to move technology from first-of-a-kind concept to prototype and industrialization, supporting the precision and reliability that photomask and EUV systems demand.
The challenges we solve
Precision actuation
We design and optimize electromagnetic actuators for nanometer-accurate positioning, comparing Lorentz and reluctance topologies to balance force efficiency, dissipation, and magnetic saturation for the best fit per application.Positioning and metrology
We develop high-accuracy stages and qualification tools for wafer and module handling, validating functional and mechanical performance across hundreds of parameters before system integration.Thermal and vacuum design
We engineer modules for high-vacuum environments and tight thermal budgets, balancing outgassing control, thermal stability, and mechanical accuracy from the earliest design phase.
Connect with us at SPIE Photomask Technology + EUV Lithography 2026
We will be exhibiting at SPIE Photomask Technology + EUV Lithography, with a poster presentation on boosting the actuator efficiency of reluctance actuators with permanent magnets. Drop by our booth or send us a message to set up a meeting. Find more information on the event here.
Project highlight:
Actuator efficiency is one of the challenges shaping next-generation lithography systems. We recently studied how adding a permanent magnet to a reluctance actuator design increases force efficiency by 45 percent, without changing its footprint.
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